Recommended enrolment pattern for students commencing Semester 2, 2010
- This enrolment pattern is designed to comply with program requirements.
- Variations are possible but should only be considered in consultation with Business faculty administrative staff.
- Students with advanced standing from prior tertiary study should consult the Faculty of Business for recommended enrolment.
- Consult the course schedule to confirm when courses are offered.
Semester 2, 2010
BUS101 Applied Research Methods
BUS106 Accounting for Business
BUS108 Introduction to Informatics
Plus select 1 course from:
COR109 Communication and Thought
COR110 Innovation, Creativity and Entrepreneurship
COR111 Environment, Technology and Sustainability
Semester 1, 2011
BUS102 Economics for Business
BUS104 Management and Organisational Behaviour
ICT210 Analysis and Project Management
Plus select 1 course from:
COR109 Communication and Thought
COR110 Innovation, Creativity and Entrepreneurship
COR111 Environment, Technology and Sustainability
Semester 2, 2011
ICT220 Telecommunications and Networks
ICT221 Software Development 1
Elective course
Elective course
Semester 1, 2012
BUS103 Business Law and Ethics
ICT211 Database Design
ICT311 Software Development 2
Elective course
Semester 2, 2012
ICT320 Database Programming
ICT321 Architecture and Systems Integration
ICT341 Industry Studies 1 ^#
Elective course
Semester 1, 2013
ICT310 Object-Oriented Analysis and Design
ICT342 Industry Studies 2 ^#
Elective course
Elective course
Industry Studies options
^ Industry studies courses are subject to approval by the Industry Studies Co-ordinator
# International students may only select from one of the following Industry Studies options.
Geographical Information Systems:
ENS253 An Introduction to Geographical Information Systems
ENS254 Satellite Image Analysis and Surveying
ENS353 Applied Spatial Analysis and Geoprocessing
ENS381 Environmental Modelling
Graphic Design:
DES211 Graphic Design A *
DES212 Graphic Design B *
DES213 Graphic Design C *
DES214 Graphic Design D *
* Subject to final approval.